Correction method for the self‐absorption effects in fluorescence extended X‐ray absorption fine structure on multilayer samples |
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Authors: | Wen‐Bin Li Xiao‐Yue Yang Jing‐Tao Zhu Yu‐Chun Tu Bao‐Zhong Mu Hai‐Sheng Yu Xiang‐Jun Wei Yu‐Ying Huang Zhan‐Shan Wang |
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Abstract: | A novel correction method for self‐absorption effects is proposed for extended X‐ray absorption fine structure (EXAFS) detected in the fluorescence mode on multilayer samples. The effects of refraction and multiple reflection at the interfaces are fully considered in this correction method. The correction is performed in k‐space before any further data analysis, and it can be applied to single‐layer or multilayer samples with flat surfaces and without thickness limit when the model parameters for the samples are known. The validity of this method is verified by the fluorescence EXAFS data collected for a Cr/C multilayer sample measured at different experimental geometries. |
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Keywords: | EXAFS self‐absorption effects multilayer X‐ray fluorescence XRR scattering  factors |
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