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Misfit-Dislocation Induced Surface Morphology of InGaAs/GaAs Heterostructures
Authors:Oksana Yastrubchak  Tadeusz Wosiński  Elżbieta Łusakowska  Tadeusz Figielski  Attila L. Tóth
Affiliation:(1) Institute of Physics, Polish Academy of Sciences, Al. Lotnikow 32/46, PL-02-668 Warsaw, Poland;(2) Research Institute for Technical Physics and Materials Science, Hungarian Academy of Sciences, Konkoly-Thege út 29-33, P. O. Box 49, H-1525 Budapest, Hungary
Abstract:The correlation between the surface cross-hatched morphology and the interfacial misfit dislocations in partially relaxed InGaAs/GaAs heterostructures was studied by means of atomic force microscopy and electron-beam induced current mode in a scanning electron microscope. A close correspondence between the misfit-dislocation network at the interface and the surface morphology shows that the cross-hatch development results primarily from the misfit-dislocation generation. Statistical analysis of the surface roughness reveals an anisotropy in strain relaxation of the epitaxial layers, which results from an asymmetry in the misfit-dislocation formation.
Keywords:: AFM   InGaAs layers   misfit dislocations   strain relaxation
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