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Design and performance of two-channel EUV multilayer mirrors with enhanced spectral selectivity
Authors:Christophe Hecquet  Franck Delmotte  Marie-Fran?oise Ravet-Krill  Sébastien de Rossi  Arnaud Jérome  Fran?oise Bridou  Fran?oise Varnière  Evgueni Meltchakov  Frédéric Auchère  Angelo Giglia  Nicola Mahne  Stefano Nanaronne
Institution:(1) Laboratoire Charles Fabry, Institut d’Optique, CNRS, Univ. Paris-Sud, Campus Polytechnique, RD 128, 91127 Palaiseau Cedex, France;(2) Institut d’Astrophysique Spatiale, CNRS, Univ. Paris-Sud, bat. 121, 91405 Orsay Cedex, France;(3) Laboratorio TASC-INFM-CNR, S.S. 14, km 163.5 in Area Science Park, Trieste, 34012, Italy;(4) Dipartimento di Ingegneria dei Materiali e dell’Ambiente, Universita di Modena e Reggio Emilia, via Vignolese 905, 41100 Modena, Italy
Abstract:In this paper, we present a study on two-channel multilayer mirrors which can operate at two wavelengths in Extreme Ultraviolet (EUV) spectral range. We propose a new method to design two-channel EUV multilayer mirrors with enhanced spectral selectivity. The mirror structure is a stack of two periodic multilayers separated by a buffer layer. We have defined the main parameters which allow adjustment of the distance between different order Bragg’s peak and of wavelength positions of reflectivity minima. Two mirrors have been designed and deposited for solar EUV telescope applications by using this method. The first mirror reflects Fe IX–X line (17.1 nm) and Fe XVI (33.5 nm) lines with attenuation of the He II line (30.4 nm). The second mirror reflects Fe IX–X and He II lines with attenuation of Fe XV (28.4 nm) and Fe XVI lines. Measurements with synchrotron radiation source confirm that, in both cases, for these mirrors, we are able to adjust reflectivity maxima (Bragg peak position) and minima. Such multilayers offer new possibilities for compact design of multi-wavelength EUV telescopes and/or for high spectral selectivity.
Keywords:PACS" target="_blank">PACS  42  79  Bh  42  15  Eq  78  67  Pt  96  60  Tf  42  79  Ci
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