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Photosensitivity and grating development in trans-4-stilbenemethanol-doped poly(methyl methacrylate) materials
Authors:JianMing Yu  XiaoMing Tao  HwaYaw Tam  M. Suleyman Demokan
Affiliation:a Institute of Textiles and Clothing, The Hong Kong Polytechnic University, Hong Kong, PR China
b Photonics Research Centre, Department of Electric Engineering, The Hong Kong Polytechnic University, Hong Kong, PR China
c Department of Information and Electronic Engineering, Zhejiang University, Hangzhou 310027, PR China
Abstract:This paper reports the photosensitivity of poly(methyl methacrylate) (PMMA) and its copolymer doped with trans-4-stilbenemethanol. UV irradiation of the doped-PMMA at 325 nm induced the trans- to cis-isomerization of the dopant. This process was confirmed by 1H NMR spectra of trans-4-stilbenemethanol in CDCL3 solvent before and after irradiation. The isomerization can be initiated by the irradiation with an intensity of 0.62 mW/cm2. Photo-induced refractive index change of −0.0024 was obtained when a PMMA copolymer film doped with 5.1 wt% dopant was exposed to 325 nm light. Lorentz-Lorenz equation was used to estimate the refractive index of a trans-4-stilbenemethanol-PMMA composite and a trans-4-stilbenemethanol-PMMA copolymer composite from the mole refraction and van der Waals volume of each component. A slight elevation of molecular packing coefficient (K) for PMMA and its copolymer containing the dopant implies a denser aggregation as compared to the polymer without the dopant. Long period gratings were created in doped-PMMA films and doped-PMMA copolymer fibers using amplitude mask technique. Gratings were confirmed by microscopic observation and diffraction patterns.
Keywords:Photosensitivity   trans-4-Stilbenemethanol   PMMA   Lorentz-Lorenz equation   Grating
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