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Modification of the surface state of rough substrates by two different varnishes and influence on the reflected light
Authors:Mady Elias  E René de la Rie  Eric Charron
Institution:a Institut des NanoSciences de Paris (INSP), Université Pierre et Marie Curie (UPMC), Campus Boucicaut, 140 rue de Lourmel, 75015 Paris, France
b National Gallery of Art, Washington, DC 20565, USA
Abstract:Modification of the visual appearance when a rough surface is covered by a varnish is mostly attributed to the levelling of the substrate surface, which depends on the molecular weight of the varnish. The topography of varnished surfaces, however, has never been measured directly. Surfaces of varnishes applied over glass substrates of varying roughness were studied, therefore, using mechanical profilometry. Two different varnishes made with a low and a high molecular weight resin were studied. Both varnishes lower the r.m.s. roughness of the substrates and filter the high spatial frequencies. These results are amplified for the varnish containing the low molecular weight resin. The light reflected by the varnished samples is modelled from these topographical data. Its angular distribution, calculated from the probability density of slopes is presented, taking into account separately the air/varnish and the varnish/substrate interfaces. These analyses are presented in a back-scattering configuration. They show that varnishing significantly reduces the angular width of the reflected light and that this effect is magnified for the low molecular weight resin. Modelling furthermore shows that the influence of the roughness of the varnish/substrate interface is negligible in the total reflected light.
Keywords:Surface state  Reflected light  Varnish  Profilometry  Modelling  Reflectance spectroscopy  Spatial frequency  Roughness
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