Harmonic generation in ZnO nanocrystalline laser deposited thin films |
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| Authors: | V Narayanan |
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| Institution: | Department of Physics, Indian Institute of Technology Kanpur, Kanpur 208 016, UP, India |
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| Abstract: | ZnO plasma produced by third harmonic 355 nm of Nd:YAG laser at various ambient pressures of oxygen was used for depositing quality nanocrystalline ZnO thin films. Time and space resolved optical emission spectroscopy is used to correlate the plasma properties with that of deposited thin films. The deposited films showed particle size of 8 and 84 nm at ambient oxygen pressure of 100 and 900 mTorr, respectively. Third harmonic generation observed in ZnO thin films deposited under 100 mTorr of ambient oxygen is reported. |
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| Keywords: | 42 65Ky 52 70 Kz 81 15 Fg |
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