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Optimization of process parameters of titanium dioxide films by response surfaces methodology
Authors:Chuen-Lin Tien  Shane-Wen Lin
Affiliation:a Department of Electrical Engineering, Feng Chia University, 100 Wenhwa Road, Seatwen, Taichung 40724, Taiwan, ROC
b Graduate Institute of Electrical and Communications Engineering, Feng Chia University, 100 Wenhwa Road, Seatwen, Taichung 40724, Taiwan, ROC
Abstract:An efficient approach for determination of the optimum process parameters for titanium dioxide coatings by using second-order response surface model is presented and investigated experimentally. Thin films were prepared by electron-beam evaporation associated with ion-beam assisted deposition by using different control factors, including starting materials, working pressure, substrate temperature, deposition rate and annealing temperature. The factorial design of the experiment was established to meet the equipment conditions and to avoid affecting the results. The main effect between various factors and interactions are independent. The significant level of both the main effects and the interaction are observed by analysis of variance (ANOVA) approach. Based on the statistical analysis, the results have provided much valuable information on the relationship between various control factors and thin film properties. Besides the optimum optical constants and surface roughness of TiO2 thin films were obtained in the range of each parameter level. The factorial prediction model for preparation parameters of thin film was also established.
Keywords:77.55.+f   81.15.Jj   74.25.Gz   07.05.Fb
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