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Formation of carbon nitride compounds during successive implantations in copper
Authors:T Thomé  JL Colaux  P Louette  G Terwagne
Institution:1. Laboratoire d’Analyses par Réactions Nucléaires, Facultés Universitaires Notre-Dame de la Paix, 61 rue de Bruxelles, B-5000 Namur, Belgium;2. Laboratoire Interdisciplinaire de Spectroscopie Electronique, Facultés Universitaires Notre-Dame de la Paix, 61 rue de Bruxelles, B-5000 Namur, Belgium
Abstract:Copper substrates are successively implanted with carbon and nitrogen (13C+ and 14N+) at high fluences (5 × 1017 and 1 × 1017 at. cm−2, respectively) in order to synthesize specific carbon nitride compounds. The concentration as well as the depth distribution of carbon 13C and nitrogen 14N are determined using non resonant nuclear reactions induced by a 1.05 MeV deuteron beam. The use of (d,p) and (d,α) reactions allows us to profile both 13C and 14N elements with a single and relatively rapid measurement and a quite good resolution. The bonded states of carbon and nitrogen are studied as a function of depth by X-ray photoelectron spectroscopy (XPS). The curve fitting of the C 1s and N 1s photopeaks shows that carbon and nitrogen atoms exist in different chemical states depending on the analysis depth, which correspond to specific kinds of chemical bonds. At least two characteristic C–N bonds are detected indicating that different carbon nitride compounds have been formed during the implantations.
Keywords:Carbon  Nitrogen  XPS  NRA  Implantation
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