流气条件下表面放电光泵浦源重复频率运行的稳定性

以高纯度Al2O3陶瓷作为放电基底，研制了重复频率表面放电光泵浦源模块，详细地讨论了流气条件下泵浦源的放电抖动和辐射强度波动，并采用高速相机拍摄了泵浦源的放电等离子体图像，研究了等离子体的空间稳定性。研究发现：在流气状态下，泵浦源的重复频率为1～5 Hz时，泵浦源的放电抖动与放电等离子体的空间稳定性受充电电压和气体流量的影响较大，随运行频率的变化较小；辐射强度波动主要与充电电压相关，基本不受气体流量和重复频率变化的影响;在大流量条件下，提高充电电压，可以有效降低混合气体流动对泵浦源放电抖动的影响，减小辐射强度波动，改善放电等离子体的空间重复性;当充电电压达到26.8 kV时，气流量在60～300 L/min范围内，泵浦源的放电抖动可以小于45 ns，辐射强度波动小于2%，放电等离子体有很好空间稳定性。研究结果表明该表面放电光泵浦源模块在流气条件下具有良好的重复频率运行稳定性。

Operation stability of repetitive pulse surface-discharge optical pumping source under gas-flow condition

An optical pumping source by segmented surface discharge on Al2O3 ceramic substrate is developed to realize stable operation of XeF(C-A) laser with pulse repetition mode. The discharge jitter and the deviation of radiation intensity are investigated under gas-flow condition. Photographs of discharge plasma are obtained by high-speed camera, and the stability of discharge plasma is investigated. The experimental results show that the discharge jitter and stability of discharge plasma mainly depend on charging voltage and gas-flow rate, but less depend on pulse repetition rate in the range of 1 to 5 Hz. The deviation of radiation intensity correlates with charging voltage mainly and is hardly unaffected by pulse repetition rate and gas-flow rate. When the charging voltage is added to 26.8 kV, the stable discharge with discharge jitter less than 45 ns, the deviation of radiation intensity below 2%, and spatially stable discharge plasma can be obtained.