Der massenspektrometrische Zerfall von Hexamethoxydisilan und Oktamethoxytrisilan |
| |
| Authors: | Doz Dr F Höfler |
| |
| Institution: | (1) Institut für Anorganische Chemie, Technische Hochschule in Graz, Stremayrgasse 16, A-8010 Graz, Österreich |
| |
| Abstract: | The decomposition (70 eV, 17 eV) of Si2(OCH3)6, Si2(OCD3)6, and Si3(OCH3)8 by electron-impact is characterized by an initial loss of the radicals CH3, Si(OCH3)3, and OCH3. For the disilanes, a typical pathway follows by successive loss of formaldehyde forming SiH-units; in the trisilane the main fragmentation path shows elimination of dimethoxysilylene previous to CH2O-abstraction. Fragmentation schemes are given, in part metastable supported. |
| |
| Keywords: | |
| 本文献已被 SpringerLink 等数据库收录！ |
|
