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气体靶激光等离子体软X-射线源实验研究
引用本文:尼启良,巩岩,林景全,陈波,曹健林.气体靶激光等离子体软X-射线源实验研究[J].光谱学与光谱分析,2003,23(1):101-103.
作者姓名:尼启良  巩岩  林景全  陈波  曹健林
作者单位:中国科学院长春光学精密机械与物理研究所,吉林 长春 130022
基金项目:国家自然科学基金重点项目支持,项目批准号 :699380 2 0
摘    要:介绍了一种无碎屑、高亮度、高工作频率的气体靶激光等离子体软X 射线源。其喷气阀门由压电陶瓷驱动 ,工作频率可达到 40 0Hz。与金属靶激光等离子体软X 射线源相比 ,此光源无碎屑。与喷嘴由电磁阀控制的气体靶激光等离子体软X 射线源相比 ,它有较高的工作频率。一工作在模拟模式的通道电子倍增器被用于探测来自光源的软X 射线辐射 ,其输出信号经过一电荷灵敏前置放大器进一步放大变成电压脉冲信号 ,脉冲幅度与输入电荷灵敏前置放大器的电量成正比。实验测得CO2 ,Xe和Kr在 8~ 2 2nm软X 射线投影光刻常用波段的光谱辐射特性。CO2 光谱包括类锂和类铍离子跃迁形成的线谱 ,Xe光谱是多电荷氙离子 4d 5f,4d 4f,4d 6p和 4d 5p跃迁所形成的光谱。Kr气体靶光谱包括类铜离子、类镍离子、类钴离子和类铁离子跃迁形成的线谱和连续谱。

关 键 词:软X-射线  激光等离子体  气体靶  软X-射线投影光刻
文章编号:1000-0593(2003)01-0101-03
修稿时间:2001年12月18

Experimental Investigation of Laser Plasma Soft X-ray Source with Gas Target
NI Qi-liang,GONG Yan,LIN Jing-quan,CHEN Bo and CAO Jian-lin State Key Lab of Applied Optics,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun ,China.Experimental Investigation of Laser Plasma Soft X-ray Source with Gas Target[J].Spectroscopy and Spectral Analysis,2003,23(1):101-103.
Authors:NI Qi-liang  GONG Yan  LIN Jing-quan  CHEN Bo and CAO Jian-lin State Key Lab of Applied Optics  Changchun Institute of Optics  Fine Mechanics and Physics  Chinese Academy of Sciences  Changchun  China
Institution:State Key Lab of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130022, China.
Abstract:This paper describes a debris-free laser plasma soft X-ray source with a gas target, which has high operating frequency and can produce strong soft X-ray radiation. The valve of this light source is drived by a piezoelectrical ceramic whose operating frequency is up to 400 Hz. In comparison with laser plasma soft X-ray sources using metal target, the light source is debris-free. And it has higher operating frequency than gas target soft X-ray sources whose nozzle is controlled by a solenoid valve. A channel electron multiplier (CEM) operating in analog mode is used to detect the soft X-ray generated by the laser plasma source, and the CEM's output is fed to to a charge-sensitive preamplifier for further amplification purpose. Output charges from the CEM are proportional to the amplitude of the preamplifier's output voltage. Spectra of CO2, Xe and Kr at 8-14 nm wavelength which can be used for soft X-ray projection lithography are measured. The spectrum for CO2 consists of separate spectral lines originate mainly from the transitions in Li-like and Be-like ions. The Xe spectrum originating mainly from 4d-5f, 4d-4f, 4d-6p and 4d-5p transitions in multiply charged xenon ions. The spectrum for Kr consists of separate spectral lines and continuous broad spectra originating mainly from the transitions in Cu-, Ni-, Co- and Fe-like ions.
Keywords:Soft X-ray  Laser plasma  Gas target  Soft X-ray projection lithography  
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