| 酚醛-重氮萘醌正性抗蚀剂溶解抑制机理 |
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| 引用本文： | 高英新,包永忠,黄志明,翁志学. 酚醛-重氮萘醌正性抗蚀剂溶解抑制机理[J]. 影像科学与光化学, 2004, 22(1): 33-43. DOI: 10.7517/j.issn.1674-0475.2004.01.33 |
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| 作者姓名： | 高英新 包永忠 黄志明 翁志学 |
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| 作者单位： | 浙江大学, 高分子工程研究所, 杭州, 310027 |
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| 摘 要： | 本文综述了酚醛 重氮萘醌正性抗蚀剂的溶解抑制机理,主要包括(1)分子间氢键作用机理;(2)偶联反应机理;(3)两步即静态、动态溶解抑制机理;(4)表面沉积溶解抑制机理;(5)酚醛树脂的分子溶解及相关的抑制机理.
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| 关 键 词： | 酚醛树脂 重氮萘醌 正性抗蚀剂 溶解抑制 |
| 收稿时间： | 2003-05-30 |
DISSOLUTION INHIBITION MECHANISMS OF POSITIVE PHOTORESIST BASED ON NOVOLAK-DNQ |
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| GAO Ying-xin,BAO Yong-zhong,HUANG Zhi-ming,WENG Zhi-xue. DISSOLUTION INHIBITION MECHANISMS OF POSITIVE PHOTORESIST BASED ON NOVOLAK-DNQ[J]. Imaging Science and Photochemistry, 2004, 22(1): 33-43. DOI: 10.7517/j.issn.1674-0475.2004.01.33 |
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| Authors: | GAO Ying-xin BAO Yong-zhong HUANG Zhi-ming WENG Zhi-xue |
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| Affiliation: | Institute of Polymer Reaction Engineering, Zhejiang University, Hangzhou 310027, P.R.China |
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| Abstract: | The mechanisms of dissolution inhibition of positive photoresist based on novolak(NVK)-diazonaphthoquinone(DNQ),including(1) the molecular hydrogen bonding interactions between novolak and DNQ;(2) mechanism of the azoxy- or azo-coupling reaction of DNQ-ester with novolak resin;(3) the two-step mechanism (also named static and dynamic inhibition) of dissolution inhibition;(4) mechanism of the surface of the photoresist;(5) the molecular dissolution of novolak related to the mechanism of inhibition,was reviewed in this paper. |
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| Keywords: | novolak diazonaphthoquinone positive photoresist dissolution inhibition |
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