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Thermo-Optic Switch using Fluorinated Silicon Oxide and Organic Spin-on-Glass Films |
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| Authors: | Hiroyasu Kondo Kazuaki Inohara Yuki Taniguchi Junko Nakahata Tetsuya Homma Hideo Takahashi |
| Institution: | (1) Postgraduate Course of Electrical Engineering, Shibaura Institute of Technology, 3-9-14, Shibaura, Minato-ku, Tokyo 108-8548, Japan;(2) Department of Electronic Engineering, Faculty of Engineering, Shibaura Institute of Technology, 3-9-14, Shibaura, Minato-ku, Tokyo 108-8548, Japan;(3) Center for Informative and Environmental Materials, Research Organization for Advanced Engineering, Shibaura Institute of Technology, 3-9-14, Shibaura, Minato-ku, Tokyo 108-8548, Japan;(4) Present address: Corporate Manufacturing Engineering Center, Toshiba Corporation, 33, Shin-isogo-cho, Isogo-ku, Yokohama, Kanagawa 235-0017, Japan |
| Abstract: | A thermo-optic switch in a thin-film optical waveguide was investigated. Fluorinated silicon oxide (SiOF) and organic spin-on-glass (SOG) films were used as core-layer and clad-layer, respectively, in the waveguide structure. The SiOF films were formed at 23#x00B0;C by a liquid-phase deposition (LPD) technique using a supersaturated hydrofluosilicic acid (H2SiF6) aqueous solution. Thermal coefficients of the refractive indices for LPD-SiOF and organic SOG films formed on silicon (Si) substrates were #x2212;4.0 #x00D7; 10#x2212;6/#x00B0;C, #x2212;60 #x00D7; 10#x2212;6/#x00B0;C at the wavelength of 632.8 nm, respectively. A high extinction ratio of 15 dB was obtained for this switch at the applied voltage of 12.8 V. |
| Keywords: | thin-film optical waveguide optical switch thermo-optic effect fluorinated silicon oxide spin-on-glass |
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