High performance a-Si solar cells and new fabrication methods for a-Si solar cells |
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Authors: | S Nakano Y Kuwano M Ohnishi |
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Institution: | (1) Research Center, SANYO Electric Co., Ltd., 1-18-13, Hashiridani, Hirakata City, Osaka, Japan;(2) Applied Research Center, SANYO Electric Co., Ltd., 100, Dainichihigashicho, Moriguchi City, Osaka, Japan |
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Abstract: | The super chamber, a separated UHV reaction-chamber system has been developed. A conversion efficiency of 11.7% was obtained for an a-Si solar cell using a high-quality i-layer deposited by the super chamber, and a p-layer fabricated by a photo-CVD method.As a new material, amorphous superlattice-structure films were fabricated by the photo-CVD method for the first time. Superlattice structure p-layer a-Si solar cells were fabricated, and a conversion efficiency of 10.5% was obtained.For the fabrication of integrated type a-Si solar cell modules, a laser pattering method was investigated. A thermal analysis of the multilayer structure was done. It was confirmed that selective scribing for a-Si, TCO and metal film is possible by controlling the laser power density. Recently developed a-Si solar power generation systems and a-Si solar cell roofing tiles are also described. |
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Keywords: | 85 60 61 40 84 60 |
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