Nanolithography using high transmission nanoscale ridge aperture probe |
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Authors: | Nicholas Murphy-DuBay Liang Wang X Xu |
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Institution: | (1) School of Mechanical Engineering, Purdue University, West Lafayette, IN 47907, USA;(2) Birck Nanotechnology Center, West Lafayette, IN 47907, USA |
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Abstract: | Nanoscale ridge apertures provide a highly confined radiation spot with a high transmission efficiency when used in the near
field approach. The radiation confinement and enhancement is due to the electric–magnetic field concentrated in the gap between
the ridges. This paper reports the experimental demonstration of radiation enhancement using such antenna apertures and lithography
of nanometer size structures. The process utilizes a NSOM (near field scanning optical microscopy) probe with a ridge aperture
at the tip, and it combines the nonlinear two photon effect from femtosecond laser irradiation to achieve sub-diffraction
limit lithography resolution. |
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Keywords: | PACS" target="_blank">PACS 07 79 Fc 81 16 Nd 81 16 Rf |
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