Water-vapor-based source of UV radiation |
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Authors: | A. A. General and S. V. Avtaeva |
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Affiliation: | (1) Dnepropetrovsk National University, 72 Gagarin str, Dnepropetrovsk, 49000, Ukraine;(2) Institute for Problems of Materials Science of NAS of Ukraine, Department # 67, 3 Krzhyzhanovsky str, Kiev, 03142, Ukraine; |
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Abstract: | The results of studying a capacitive discharge in water vapor are reported. This discharge is an effective and environmentally friendly source of UV radiation due to hydroxyl OH (A 2Σ+ → X 2Π transition) in the wavelength range 280–330 nm. It is shown that, at E/N < 210 Td, the discharge is greatly influenced by dissociative attachment of electrons, while at E/N > 210 Td, ionization dominates over dissociation. The formation rate of excited OH* radicals (A 2Σ+) in the water-vapor discharge is much higher than the formation rate of emitting states in hydrogen and oxygen atoms. As E/N grows, the ratio between the intensities of OH lines and atomic hydrogen Balmer series decreases. According to estimates, E/N values optimal for the OH radical line excitation fall into the range 250–400 Td. |
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