| 真空装置中的常见污染和清洁处理 |
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| 引用本文： | 陈占杰. 真空装置中的常见污染和清洁处理[J]. 电子工业专用设备, 2006, 35(6): 61-64 |
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| 作者姓名： | 陈占杰 |
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| 作者单位： | 中国电子科技集团公司第四十五研究所,北京,东燕郊,101601 |
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| 摘 要： | 主要介绍了真空装置中常见污染的形成、类型以及清洁处理的方法和真空工艺对环境的要求。
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| 关 键 词： | 真空装置 污染物 清洁处理 |
| 文章编号： | 1004-4507(2006)06-0061-04 |
| 收稿时间： | 2006-04-08 |
| 修稿时间： | 2006-04-08 |
Common Contaminations in Vacuum Devices and Their Cleaning Ways |
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| CHEN Zhan-jie. Common Contaminations in Vacuum Devices and Their Cleaning Ways[J]. Equipment for Electronic Products Marufacturing, 2006, 35(6): 61-64 |
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| Authors: | CHEN Zhan-jie |
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| Affiliation: | The 45 Electronic Institute of CETC,Beijing East Yanjiao, 101601,China |
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| Abstract: | This paper mainly introduce how dose the common appear in vacuum devices ,what kinds of contamination are there ,the cleaning ways and vacuum technics,require for environment . |
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| Keywords: | Vacuum devices Contamination Clean |
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