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Operation of a Raman laser in bulk silicon
Authors:Rhee Hanjo  Lux Oliver  Meister Stefan  Woggon Ulrike  Kaminskii Alexander A  Eichler Hans Joachim
Institution:Institute of Optics and Atomic Physics, Technische Universit?t Berlin, 10623 Berlin, Germany. hanjo.rhee@physik.tu‐berlin.de
Abstract:A Raman laser based on a bulk silicon single crystal with 1.127 μm emission wavelength is demonstrated. The Si crystal with 30 mm length was placed into an external cavity and pumped by a Q-switched Nd:YAG master oscillator power amplifier system. Strong defocusing of the pump and Raman laser beam by free carriers was compensated by an intracavity lens. Raman laser operation with a pulse duration of 2.5 ns was identified by a Raman laser threshold significantly lower than the single-pass stimulated Raman-scattering threshold. Linear absorption losses of the 1.06415 μm pump radiation are strongly reduced by cooling the Si crystal to a temperature of 10 K.
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