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The effect of UV exposure on the track and bulk etching rates in different CR-39 plastics
Authors:A H Khayrat  S A Durrani
Institution:

School of Physics & Space Research, University of Birmingham, Birmingham B15 2TT, U.K.

Abstract:It is observed that for both UK and Japanese CR-39 detectors the mean diameters of fission fragment and alpha tracks from a Cf-252 source become larger as a result of UV exposure; but in the case of ‘UV exposure last’ (i.e. Cf + UV) the diameters are larger than in the case of ‘UV exposure first’ (i.e. UV + Cf). The bulk and track etching rates undergo an increase with UV exposure for the two kids of CR-39.
Keywords:Ultraviolet exposure  Track diameters  Sensitivity  Bulk etching rate  Track etching rate  Cf-252 source
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