Photoemission of Xe and Kr adsorbed on the W(110) plane |
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Authors: | R. Opila R. Gomer |
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Affiliation: | Department of Chemistry and The James Franck Institute, The University of Chicago, 5640 South Ellis Avenue, Chicago, Illinois 60637, USA |
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Abstract: | The UPS and XPS spectra of Xe adsorbed on clean, O, CO, and Xe covered W(110) surfaces and the UPS spectrum for Kr on clean and O covered W(110) surfaces have been investigated. On clean W, Xe and Kr show a splitting of the and hole states respectively. For Xe the coverage dependence of this splitting was investigated in detail; neither the positions nor the intensity ratio of the substates are coverage dependent for θ ? 0.04, suggesting that splitting is due to differences in the image interaction of the and components. For Xe equal shifts, relative to vacuum, of ~1.0 eV were observed for 5p, 4d, and 3d levels, suggesting that initial state effects are small. Image interaction for Xe and Kr on clean W could best be fitted by assuming an increase, rather than a decrease in the effective hole-image separation from the nominal value, suggesting that the image plane is moved back into the metal by a screening length. For Xe adsorbed on (110), or on virgin- polarization of the intermediate layers was found to contribute significantly to relaxation. Coadsorbed oxygen broadened Xe 5p and Kr 4p peaks. There was an almost linear relation between O 2p UPS intensity at the energies of the various peaks and the amounts of broadening, suggesting that the latter results from resonance neutralization by electrons from the O 2p states. |
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