Nanopatterned surface with adjustable area coverage and feature size fabricated by photocatalysis |
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| Authors: | Yang Bai Yan Zhang Wei Li Xuefeng Zhou Changsong Wang Xin Feng Luzheng Zhang Xiaohua Lu |
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| Institution: | aState Key Laboratory of Materials-oriented Chemical Engineering, Nanjing University of Technology, Nanjing, Jiangsu 210009, China;bPetroleum Research Recovery Center, New Mexico Institute of Mining and Technology, Socorro, NM 87801, USA |
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| Abstract: | We report an effective approach to fabricate nanopatterns of alkylsilane self-assembly monolayers (SAMs) with desirable coverage and feature size by gradient photocatalysis in TiO2 aqueous suspension. Growth and photocatalytic degradation of octadecyltrichlorosilane (OTS) were combined to fabricate adjustable monolayered nanopatterns on mica sheet in this work. Systematic atomic force microscopy (AFM) analysis showed that OTS-SAMs that have similar area coverage with different feature sizes and similar feature size with different area coverages can be fabricated by this approach. Contact angle measurement was applied to confirm the gradually varied nanopatterns contributed to the gradient of UV light illumination. Since this approach is feasible for various organic SAMs and substrates, a versatile method was presented to prepare tunable nanopatterns with desirable area coverage and feature size in many applications, such as molecular and biomolecular recognition, sensor and electrode modification. |
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| Keywords: | Atomic force microscopy (AFM) Self-assembled monolayers (SAMs) Feature size Area coverage Photocatalysis |
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