Mutual diffusion in the titanium-vanadium-niobium system |
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Authors: | B K Aitbaev V I Gryzunov E M Sokolovskaya |
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Institution: | (1) Kazakh Chemicotechnological Institute, USSR |
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Abstract: | Mutual diffusion is investigated in the Ti-V-Nb system at 1000 and 1200°C. A computation is performed by the Matano-Kirkaldy method for 89 points of an isothermal section at 1200°C and 101 points at 1000°C. Niobium was selected as solvent. It is found that the diagonal mutual diffusion coefficients grow by almost two orders as the composition approaches the titanium angle. Nondiagonal coefficients take on both positive and negative values.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 10, pp. 86–91, October, 1985. |
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