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Monolayer pattern evolution via substrate strain-mediated spinodal decomposition
Authors:Schneider Kevin S  Lu Wei  Owens Thomas M  Fosnacht Daniel R  Holl M M Banaszak  Orr B G
Institution:Chemistry Department, The University of Michigan, Ann Arbor, Michigan 48109-1055, USA.
Abstract:Investigations of octylsilane (C8H17SiH3) monolayer pattern formation on Au(111) are reported. Scanning tunneling microscopy data display the evolution of a approximately 6 nm scale pattern of interwoven features concomitant with ejection of surface Au atoms and relaxation of the Au(111) 23xsqrt3] surface reconstruction. Numerical simulations suggest the surface dynamics are governed by a substrate strain-mediated spinodal decomposition mechanism, novel to organic monolayer formation. Collectively, the experimental and theoretical data indicate strain-inducing Si-Au bond interactions drive the pattern formation and the alkyl chains play a negligible role.
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