Monolayer pattern evolution via substrate strain-mediated spinodal decomposition |
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Authors: | Schneider Kevin S Lu Wei Owens Thomas M Fosnacht Daniel R Holl M M Banaszak Orr B G |
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Institution: | Chemistry Department, The University of Michigan, Ann Arbor, Michigan 48109-1055, USA. |
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Abstract: | Investigations of octylsilane (C8H17SiH3) monolayer pattern formation on Au(111) are reported. Scanning tunneling microscopy data display the evolution of a approximately 6 nm scale pattern of interwoven features concomitant with ejection of surface Au atoms and relaxation of the Au(111) 23xsqrt3] surface reconstruction. Numerical simulations suggest the surface dynamics are governed by a substrate strain-mediated spinodal decomposition mechanism, novel to organic monolayer formation. Collectively, the experimental and theoretical data indicate strain-inducing Si-Au bond interactions drive the pattern formation and the alkyl chains play a negligible role. |
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