Aspects of nanometer scale imaging with extreme ultraviolet (EUV) laboratory sources |
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Authors: | P W Wachulak M C Marconi A Isoyan L Urbanski A Bartnik H Fiedorowicz R A Bartels |
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Institution: | (1) Department of Physics, University of South Florida, 4202 E. Fowler Avenue, Tampa, FL 33620, USA |
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Abstract: | Imaging systems with nanometer resolution are instrumental to the development of the fast evolving field of nanoscience and
nanotechnology. Decreasing the wavelength of illumination is a direct way to improve the spatial resolution in photon-based
imaging systems and motivated a strong interest in short wavelength imaging techniques in the extreme ultraviolet (EUV) region.
In this review paper, various EUV imaging techniques, such as 2D and 3D holography, EUV microscopy using Fresnel zone plates,
EUV reconstruction of computer generated hologram (CGH) and generalized Talbot self-imaging will be presented utilizing both
coherent and incoherent compact laboratory EUV sources. Some of the results lead to the imaging with spatial resolution reaching
50 nm in a very short exposure time. These techniques can be used in a variety of applications from actinic mask inspection
in the EUV lithography, biological imaging to mask-less lithographic processes in nanofabrication. |
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