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电子束在不同介质界面附近剂量跃变的蒙特卡罗模拟
引用本文:冉蜀阳,傅玉川,罗正明.电子束在不同介质界面附近剂量跃变的蒙特卡罗模拟[J].四川大学学报(自然科学版),2004,41(1):101-105.
作者姓名:冉蜀阳  傅玉川  罗正明
作者单位:四川大学原子核科学技术研究所·辐射物理与技术教育部重点实验室,成都,610064
摘    要:在许多辐射剂量的应用中,都会涉及到如何精确地计算两种介质界面附近的剂量问题。作者用不同的多次散射模型,对多种介质界面附近的剂量跃变进行了蒙特卡罗模拟,并与相应的实验结果进行比较,研究了使用不同的多次散射模型对计算结果的影响。

关 键 词:不同介质界面  剂量跃变  蒙特卡罗模拟
文章编号:0490-6756(2004)01-0101-05

Accurate Monte Carlo Simulation of Electron Energy Deposition in Extended Media
RAN Shu-yang,FU Yu-chuan,LUO Zheng-ming ics and Technology of Education Ministry of China,Sichuan University,Chengdu ,China.Accurate Monte Carlo Simulation of Electron Energy Deposition in Extended Media[J].Journal of Sichuan University (Natural Science Edition),2004,41(1):101-105.
Authors:RAN Shu-yang  FU Yu-chuan  LUO Zheng-ming ics and Technology of Education Ministry of China  Sichuan University  Chengdu  China
Institution:RAN Shu-yang,FU Yu-chuan,LUO Zheng-ming ics and Technology of Education Ministry of China,Sichuan University,Chengdu 610064,China)
Abstract:Energy deposition near the different media play an important role in many applied aspects of radiation dosimetry.Energy deposition in extended media(Al-Au, Cu-polystyrene, Be-Au-Be) is calculated with different multiple scattering (MS) of electrons models by Monte Carlo method respectively. The simulation results match the experiment acceptable well and show the differences caused by the MS models used.
Keywords:extended media  energy deposition  Monte Carlo simulation
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