Kinetic and equilibrium study of Br atom reactions with trimethylsilane using the very low pressure reactor technique

The very low pressure reactor technique was used for measurement of the forward (k₁) and reverse (k_?1) rate constants for the Br atom reaction with trimethylsilane: Br + (CH₃)₃SiH ? HBr + (CH₃)₃S1. From the kinetic data and entropy estimation the bond dissociation energy for SiH in trimethylsilane is 90.1 = 1.1 kcal/mole. The Arrhenius parameters for k₁ and k_?1 were obtained.