首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Preparation and characterization of semiconductor GNR-CNT nanocomposite and its application in FET
Institution:1. Faculty of Physics, Kharazmi University, 49 Mofateh Avenue, Tehran 15719-14911, Iran;2. Material Research Center, Metalogy Group, Tehran, Iran;1. Department of Electronics & Communication Engineering, Malaviya National Institute of Technology, Jaipur, India;2. Department of Electronics Engineering, Aligarh Muslim University, Aligarh, India;1. Department of Electrical and Electronics Engineering, Atilim University, 06836 Ankara, Turkey;2. Department of Physics, Middle East Technical University, 06800 Ankara, Turkey;3. Virtual International Scientific Research Centre, Baku State University, 1148 Baku, Azerbaijan;3. Institute of Physics, Opole University of Technology, 75, Ozimska str., 45370 Opole, Poland;4. Vlokh Institute of Physical Optics, 23, Dragomanov str., 79005 Lviv, Ukraine;5. Institute of Physics, Jan Dlugosz University, 13/15, Armii Krajowej al., 42200 Czestochowa, Poland;1. Tyndall National Institute, Dyke Parade, Cork, Ireland;2. Intel Corporation, 2200 Mission College Blvd., Santa Clara, CA 95054-1549, USA
Abstract:So far, little is known about the experimental potential of graphene nanoribbon-carbon nanotube (GNR-CNT) heterostructure as a semiconductor nanocomposite. The present work examined the structural features, topography and electronic properties of GNR-CNT nanocomposite by using Raman spectroscopy, transmission electron microscopy, scanning tunneling microscopy and spectroscopy (STS). The homogenous semiconductor GNR-CNT nanocomposites were produced under optimized synthesis conditions. The narrow band gap was exhibited by optimization of the reduction step. The STS of the micro-scale surface of the nanocomposite shows local density of state in selected areas that represent the 0.08 eV band gap of a homogenous nanocomposite. The potential of the semiconductor nanocomposite was considered for application in stacked graphene nanoribbon-field effect transistors (SGNR-FETs). A simple method of device fabrication is proposed based on a semiconductor stacked GNR nanocomposite. The high hole mobility and rectifying effect of the p–n junction of the SGNR nanocomposite on TiO2 are demonstrated. The optimal thickness for the back gate TiO2 dielectric for the tested devices was 40 nm. This thickness decreased leakage current at the p–n junction of the SGNR/TiO2 interface, which is promising heterojunction for optoelectronics. The thickness of gate dielectric and quantum capacitance of the gate was investigated at the low 40 nm thickness by calculating the mobility. In the proposed SGNR-FET, holes dominate electrical transport with a high mobility of about 1030 cm2/V s.
Keywords:Graphene nanoribbon  Nanocomposite  Rectifying effect  p–n junction  Quantum capacitance
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号