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Preferential segregation of dopants in μc-Si:H
Authors:Toshihiko Hamasaki  Masato Ueda  Yukio Osaka  Masataka Hirose
Institution:Department of Electrical Engineering, Hiroshima University Higashihiroshima 724, Japan
Abstract:Electronic and structural properties of heavily B-doped μc-Si:H films prepared by rf glow discharge technique have been studied by Raman scattering, IR absorption, SIMS and conductivity measurements. It is found that boron atoms in μc-Si:H tend to segregate in the amorphous tissue. The remarkable difference in doping efficiency between B- and P-doped μc-Si:H was interpreted in terms of the different degree of dopant segregation in the amorphous phase.
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