Influence of gas flow direction on DC glow-discharge deposited a-Si films |
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| Authors: | P Kocian G Bugmann D Erni S Bourquard |
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| Institution: | Federal Institute of Technology, Laboratory of Applied Physics, Lausanne, Switzerland |
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| Abstract: | Influence of the electrical and of the aerodynamical parameters of a DC glow discharge in silane on the properties of a-Si films deposited in different sites of the glow-discharge has been investigated. It has been found that the electric as well as aerodynamic asymmetry of the DC discharge influence considerably the film properties. Under certain conditions it is possible to obtain semimetallic films without photoeffect. |
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