Morphological fluctuations in discharge-produced μc-Si:H studied by small angle X-ray scattering |
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| Authors: | Seiichi Miyazaki Yasuyoshi Mishima Masataka Hirose Yukio Osaka |
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| Institution: | Department of Electrical Engineering, Hiroshima University, Higashihiroshima 724, Japan |
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| Abstract: | Structural inhomogeneities of μc-Si:H in the range 20≈500 A are observed for the first time by small angle X-ray scattering. Inhomogeneous distributions of bonded hydrogen in the amorphous tissue are suggested to be a possible origin of the SAXS yield. Such inhomogeneities can be reduced when the average grain size and volume fraction of microcrystallites are simultaneously increased. |
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