| 氧等离子体处理对氧化锆薄膜性质的影响 |
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| 引用本文： | 张东平,张大伟,范树海,赵元安,邵建达,范正修. 氧等离子体处理对氧化锆薄膜性质的影响[J]. 光学技术, 2005, 31(2): 224-226 |
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| 作者姓名： | 张东平 张大伟 范树海 赵元安 邵建达 范正修 |
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| 作者单位： | 中国科学院,上海光学精密机械研究所薄膜中心,上海,201800;中国科学院,研究生院,北京,100864;中国科学院,上海光学精密机械研究所薄膜中心,上海,201800 |
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| 摘 要： | 用低能氧等离子体对电子束热蒸发后的沉积氧化锆薄膜进行了后处理。通过对其光学性质、缺陷密度、弱吸收及抗激光辐照等性质的研究后发现,经氧等离子体处理后的氧化锆薄膜的折射率、消光系数、缺陷密度及吸收率等均有所降低,薄膜的激光损伤阈值较未处理的样品有了较大的提高。分析探讨了氧等离子体处理技术对薄膜性质的影响。
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| 关 键 词： | 薄膜 氧等离子体 氧化锆 |
| 文章编号： | 1002-1582(2005)02-0224-03 |
| 修稿时间： | 2004-06-10 |
Effect of the treatment by oxygen plasma on properties of ZrO2 thin film |
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| ZHANG Dong-ping,ZHANG Da-wei,FAN Shu-hai,ZHAO Yuan-an,SHAO Jian-da,FAN Zheng-xiu. Effect of the treatment by oxygen plasma on properties of ZrO2 thin film[J]. Optical Technique, 2005, 31(2): 224-226 |
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| Authors: | ZHANG Dong-ping ZHANG Da-wei FAN Shu-hai ZHAO Yuan-an SHAO Jian-da FAN Zheng-xiu |
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| Affiliation: | ZHANG Dong-ping~ |
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| Abstract: | ZrO_2 films deposited by electron beam evaporation method are treated by oxygen plasma. It is found by the study on optical properties, defect density, weak absorption and laser resistance, that the refractive index, extinction coefficient, defect density and absorption are all decreased after ZrO_2 treated by oxygen plasma, and the laser-induced damage threshold is improved. The mechanism of the properties changing after treatment by oxygen plasma is analyzed. |
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| Keywords: | thin film oxygen plasma ZrO_2 |
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