Universal threshold for the steam laser cleaning of submicron spherical particles from silicon |
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| Authors: | M. Mosbacher V. Dobler J. Boneberg P. Leiderer |
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| Affiliation: | (1) Department of Applied Physics, University of Electronic Science and Technology of China, Chengdu, 610054, People's Republic of China;(2) Department of Nuclear Engineering and Radiological Sciences, University of Michigan, MI Ann Arbor, 48109-2014, USA; |
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| Abstract: | The efficiency of the "steam laser cleaning" process is examined. For the investigation of the physics of particle removal from the particularly interesting surface of silicon we have deposited well-characterized spherical polymer and silica particles of different diameters ranging from several tens to hundreds of nanometers on commercial wafers. As a result of our systematic study we observe a sharp threshold of the steam cleaning process at 110 mJ/cm2 (5=532 nm, FWHM=7 ns) which is independent of the size (for particles with diameters as small as 60 nm) and material of the particles. An efficiency above 90% after 20 cleaning steps is reached at a laser fluence of 170 mJ/cm2. Experiments with irregularly shaped alumina particles exhibit the same threshold as for spherical particles. |
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