| Abstract: | A new strategy toward patterned polymer brushes combining the spatially controlled deposition of poly(hydroxymethyl‐p‐xylylene)‐co‐(p‐xylylene)] ( 1 ) by chemical vapor deposition (CVD) polymerization of 4‐(hydroxymethyl)2.2]paracyclophane and surface‐initiated ring‐opening polymerization was developed. Patterns of polymer brushes with thicknesses between 53 and 538 Å were created. The approach does not require photolithographic tools and has potential applicability to a wide range of different substrates, such as glasses, polymers, metals or composites. |
