Bistability in a H-terminated Si(1 0 0)2 × 1 surface obtained by ab initio transport calculations |
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Authors: | Y. Gohda S. Watanabe |
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Affiliation: | a Department of Materials Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan b CREST, Japan Science and Technology Agency, 4-1-8 Honcho, Kawaguchi, Saitama 332-0012, Japan |
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Abstract: | We have analyzed electron tunneling due to the electric field from a hydrogen-terminated Si(1 0 0)2 × 1 ultrathin film on a metal substrate by density functional transport calculations. We have obtained a hysteresis loop in the tunneling current, which comes from the existence of two electronic structures. Furthermore, we have clarified that, as a condition of bistable electron transport, a double-barrier potential structure is not necessarily required for zero field, because it can be induced by the electric field. |
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Keywords: | Density functional calculations Electron transport Surface electronic phenomena (work function, surface potential, surface states, etc.) Silicon Insulating surfaces |
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