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Adsorption and reaction of formaldehyde on thin-film cerium oxide
Authors:J Zhou
Institution:Oak Ridge National Laboratory, Oak Ridge, P.O. Box 2008, MS 6201, Oak Ridge, TN 37831-6201, United States
Abstract:Formaldehyde adsorption and reaction have been studied on cerium oxide thin films that were vapor deposited on Ru(0 0 0 1). The formaldehyde behavior was examined as a function of temperature, exposure and Ce oxidation state. Formaldehyde chemisorbs on fully oxidized CeO2 as dioxymethylene, CH2O2. The dioxymethylene decomposes and desorbs as formaldehyde between 200 K and 400 K. No other products are formed. On reduced ceria, formaldehyde also adsorbs as dioxymethylene. In addition to the formaldehyde desorption between 200 K and 400 K, a more strongly bound form of dioxymethylene is formed that produces formaldehyde at 440 K. Above 400 K, some of the dioxymethylene reacts to form formate and methoxy on the surface. These species decompose to produce H2, CO and CH2O above 500 K.
Keywords:Cerium  Aldehydes  Thermal desorption spectroscopy  Soft X-ray photoelectron spectroscopy  Near edge extended X-ray absorption fine structure (NEXAFS)  Catalysis
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