Laser desorption of NO from a thick C60 film |
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Authors: | T. Hoger C. Marzok R.T. Jongma H. Zacharias |
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Affiliation: | Physikalisches Institut, Westfälische Wilhelms-Universität, Wilhelm-Klemm-Strasse 10, 48149 Münster, Germany |
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Abstract: | The desorption of NO molecules from a thick C60 film is reported. A thermal desorption spectrum indicates two adsorption sites with binding energies of Eb = 0.30 eV and 0.55 eV. For laser desorption the fullerene surface is exposed to NO and excited by 7 ns UV laser pulses. Desorbing NO molecules are recorded state selectively as well as time resolved. The time-of-flight measurement indicates three different desorption pathways. A fast channel shows rovibronic temperatures of Trot(v″ = 0) = 370 K, Trot(v″ = 1) = 390 K and Tvib = 610 K as well as strong rotational-translational coupling. The desorption yield for the fast channel increases linearly with pulse energy with a desorption cross section of σ = (5.1 ± 0.9) × 10−17 cm2. Dominating the signal for small J″ values is a slow channel with low rotational and translational temperatures of about 110 K. We assign this peak to a laser-induced thermal desorption. For large pump-probe delays the data deviate from the Maxwellian flux distribution and a third channel appears with extremely late arrival times. |
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Keywords: | C60 Fullerene NO Laser desorption Thermal desorption spectroscopy |
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