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Electrodeposition of epitaxial nickel films on GaAs
Authors:P Evans  C Scheck  R Schad  G Zangari
Institution:

a Center for Materials for Information Technology, University of Alabama, P.O. Box 870209, Tuscaloosa, AL 35487, USA

b Department of Physics and Astronomy, University of Alabama, P.O. Box 870324, Tuscaloosa, AL 35487, USA

c Department of Materials Science and Engineering, University of Virginia, P.O. Box 400745, Charlottesville, VA 22904-4745, USA

Abstract:The structural and magnetic properties of Ni films grown by electrodeposition from simple sulfate solutions directly onto the (0 0 1) and (0 1 1) surfaces of n-GaAs have been studied. In-plane X-ray diffraction has been used to show that Ni grows on (0 0 1) GaAs with two different preferred epitaxial relationships: (1) perpendicular to plane (0 0 1)Nishort parallel(0 0 1)GaAs and preferred orientation in-plane 1 0 0]Nishort parallel1 1 0]GaAs and (2) perpendicular to plane (0 1 1)Nishort parallel(0 0 1)GaAs and preferred orientation in-plane 1 1 1]Nishort parallel1 1 0]GaAs. Nickel films grown on (0 1 1) n-GaAs show only a single preferred growth relationship: perpendicular to plane (1 1 1)Nishort parallel(0 1 1)GaAs and in-plane 1 1 0]Nishort parallel1 1 0]GaAs. The magnetic properties were strongly dependent on the substrate orientation. The films grown on GaAs (0 0 1) showed a small but definite four-fold magnetic anisotropy in plane with the highest remanence being found along the GaAs 1 0 0] direction. In contrast, the Ni films grown on the (0 1 1) GaAs showed a pronounced uniaxial anisotropy with an anisotropy field of approximately 500 Oe.
Keywords:Ferromagnetic layers  Electrodeposition  Epitaxial growth  Anisotropy
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