Depression in the cloud point of Tween in the presence of glycol additives and triblock polymers

Cloud point (C_P) measurements of Tween 20 and Tween 80 were carried out in the presence of various glycol oligomers and triblock polymers (TBP). The cloud points of both Tween 20 and 80 decrease in the presence of both types of additives. Among the glycol oligomeric additives, ethylene glycol monobutyl ether was found to reduce the C_P maximum. An increase in the repeating units of polymeric glycol additives leads to a decrease in C_P. Reduction in the C_P in the presence of TBP depends upon the increase in hydrophobic/hydrophilic ratio among the polypropylene to polyethylene units.