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Structural and electronic model of negative electron affinity on the Si/Cs/O surface
Authors:Jules D Levine
Institution:RCA Laboratories, Princeton, New Jersey 08540, U.S.A.
Abstract:Structural and electronic models are proposed which correlate Goldstein's LEED, Auger, photo-emission, plasmon, and desorption data for negative electron affinity (NEA) on Si(100) surfaces. In the structural model, the surface Si atoms group into adjacent rows of surface “pedestals” and surface “caves”. Their density is 3.4 × 1014 cm?2 each, as inferred from the LEED 2 × 2 reconstruction pattern and other data. Adsorbed Cs resides in fourfold coordination with Si atop the pedestals. Adsorbed oxygen is completely submerged in the caves of aperture 2.98Å to give a Cs-O dipole length of 2.9Å. Similar structural arguments show why Cs must be adsorbed before O2, and why Si(111) does not exhibit NEA. In the electronic model, the surface dielectric constant, 5.3. obtained from the surface plasmon energy, 7 eV, is used to compute the dipole length from the final work function, 0.9 eV. It is 2.8Å in excellent agreement with the dipole length computed from the above structural model. Some properties of the “induced” surface states in the presence of Cs and O are also described.
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