Preparation and properties of polyhedral oligomeric silsesquioxane polymers |
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| Authors: | Takahiro Shioda Takahiro Gunji Noritaka Abe Yoshimoto Abe |
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| Affiliation: | 1. Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science, Tokyo, Japan;2. Department of Food Science, Faculty of Health and Nutrition, Tokyo Seiei College, Tokyo, Japan |
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| Abstract: | Polyhedral oligomeric silsesquioxane (POSS) polymers were synthesized by the dehydrogenative condensation of (HSiO3/2)8 with water in the presence of diethylhydroxylamine followed by trimethylsilylation. Coating films were prepared by spin‐coating of the coating solution prepared by the dehydrogenative condensation of POSS. The hardness of the coating films was evaluated using a pencil‐hardness test and was found to increase up to 8H with increases in the curing temperature. Free‐standing film and silica gel powder were prepared by aging the coating solution at room temperature. The silica gel powder was subjected to heat treatment under air atmosphere to show a specific surface area of 440 m2 g−1 at 100 °C, which showed a maximum at 400 °C as 550 m2 g−1. Copyright © 2011 John Wiley & Sons, Ltd. |
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| Keywords: | polyhedral oligomeric silsesquioxane diethylhydroxylamine dehydrogenative condensation silica gel free‐standing film |
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