Direct patterning of polysilanes and polygermanes using interference lithography |
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| Authors: | Yun Yang Cheng Lu Eva A Dias Robert H Lipson Kim M Baines |
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| Institution: | Department of Chemistry, University of Western Ontario, London, ON, Canada N6A 5B7 |
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| Abstract: | The direct patterning of poly(p‐methoxyphenylmethylsilane) (PMPMS) and poly(p‐methoxyphenylmethylgermane) (PMPMG) by interference lithography is reported. Copyright © 2011 John Wiley & Sons, Ltd. |
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| Keywords: | polygermanes polysilanes interference lithography |
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