LEED thermal studies down to very low temperatures |
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| Authors: | J.B. Theeten J.L. Domange J.P. Hurault |
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| Affiliation: | Laboratoires d''Electronique et de Physique Appliquée, 3, avenue Descartes, 94 - Limeil-Brévannes, France |
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| Abstract: | We describe an apparatus for performing LEED experiments down to 10 K and with possible temperatures variations as fast as 100 K/min in the range 10–300 K. We discuss the results obtained in the two typical cases: first on Si (111) 7×7 (clean surface case) then on Ni (100) + S c (2×2) (adsorbed layer case). Due to the effects of multiple scattering, it is difficult to separate surface from bulk contributions in the medium-voltage range. |
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