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Round robin test for depth profiling of SiO2/Si multilayer. |
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| Authors: | Isao Kojima Yasushi Azuma Junhua Xu Takayuki Saitou So Yonekubo Naoko Shimosato |
| Institution: | Materials Characterization Division, National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, AIST Tsukuba Central 5, Higashi 1-1, Tsukuba, Ibaraki 305-8565, Japan. |
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