Photochemistry of Aliphatic Nitroxide Radicals Grafted onto Activated Aerosil Surface

The mechanism of photoinduced transformations of nitroxide radicals SiON(O^·)CH₃ (I) and SiOCH₂N(O^·)CH₃ (II) obtained on the activated aerosil surface was studied. The nitroxides were photolyzed with 436-nm light at 77 K. It was shown that the action of light in the long-wavelength absorption band corresponding to the n–* transition resulted in the dissociation of the O–N or C–N bond in radicals I or II, respectively. The quantum yields of these reactions were found to be 0.6 and 0.002, respectively.