Fast resistive reconnection regime in the nonlinear evolution of double tearing modes |
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Authors: | Wang Z X Wang X G Dong J Q Lei Y A Long Y X Mou Z Z Qu W X |
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Affiliation: | State Key Lab of Materials Modifications by Beams, School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian, China 116024. |
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Abstract: | Phases of nonlinear double tearing modes are studied numerically. The first two phases lead to the formation and growth of magnetic islands and are followed by a fast reconnection phase to complete the process, driven by a process of neighboring magnetic separatrices merging and magnetic islands coupling. The fast growth can be understood as a result of the island interaction equivalent to a steadily inward flux boundary driven. Resistivity dependences for various phases are studied and shown by scaling analysis for the first time. It is found that after an early Sweet-Parker phase with a eta(1/2)-scale, a slow nonlinear phase in a Rutherford regime with a eta(1)-scale is followed by the fast reconnection phase with a eta(1/5)-scale. |
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