| 利用Cramér-Rao理论研究相位差法的最佳离焦量 |
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| 引用本文： | 单永光,刘晓凤,贺洪波,范正修. 利用Cramér-Rao理论研究相位差法的最佳离焦量[J]. 强激光与粒子束, 2011, 23(6): 0. DOI: 10.3788/HPLPB20112306.1421 |
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| 作者姓名： | 单永光 刘晓凤 贺洪波 范正修 |
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| 作者单位： | 1.中国科学院 光电技术研究所, 成都 61 0209; |
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| 摘 要： | 针对光子数足够多的情况，利用Cramér-Rao理论研究了在选取离焦作为附加像差时，不同的待测波前和目标对最佳离焦量选取的影响。结果表明:在点目标情况下，像差的大小和空间频率对最佳离焦量的影响不大；而在扩展目标情况下，最佳离焦量虽然与待测像差的空间频率关系不明显，但随着待测像差峰谷值的增大而增大。最佳离焦量与目标的结构有关而与其扩展程度关系不大，成像时目标上各点的干扰越大，最佳离焦量越大。
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| 关 键 词： | 波前传感技术 最佳离焦量 Cramér-Rao下限 相位差法 |
| 收稿时间： | 1900-01-01; |
Research progress of nodular defect in optical coatings |
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| Shan Yongguang,Liu Xiaofeng,He Hongbo,Fan Zhengxiu. Research progress of nodular defect in optical coatings[J]. High Power Laser and Particle Beams, 2011, 23(6): 0. DOI: 10.3788/HPLPB20112306.1421 |
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| Authors: | Shan Yongguang Liu Xiaofeng He Hongbo Fan Zhengxiu |
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| Affiliation: | 1.Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China;2.The Key Laboratory on Adaptive Optics,Chinese Academy of Sciences,Chengdu 610209,China;3.College of Opto-Electronics Science and Engineering,National University of Defense Technology,Changsha 410073,China |
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| Abstract: | Based on our achievements and that of peers of home and abroad,several aspects of nodular defect are summarized and reviewed.The size,shape and surface properties of nodule seed determinate the size,boundaries continuity and topography of nodule.The seed sources are mainly the residue during the processing and cleaning of substrate,contamination from the coating chamber and particulate from the evaporation source material.The corresponding methods to eliminate the seed source are given.The electronic field ... |
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| Keywords: | nodular defect nodule ejection laser damage laser damage threshold mitigation |
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