Determination of cadmium by an improved double chamber electrothermal vaporization inductively coupled plasma atomic emission spectrometry

An improved double chamber electrothermal vaporization (ETV) system was designed. A new inner chamber and its bottom plate made of quartz glass were attached with carrier support gas inlet port for the determination of cadmium by inductively coupled plasma atomic emission spectrometry (ICP-AES). The use of the inner chamber in combination with the plate played important roles to transport the metal vapor efficiently into argon ICP. Ten-μl sample aliquots were dried at 100 °C and subsequently heated at 1000 °C on the tungsten boat furnace. The evolved vapor was swept into the ICP source through PTFE tubing and the inner chamber by a 0.8 l/min H₂ (7%)-Ar carrier gas. The performance parameters of ETV-ICP-AES such as temperature program and gas flow rate were evaluated using cadmium standard solution. Under the optimized experimental conditions, the best attainable detection limit at Cd II 214.438 nm line was 0.2 ng/ml with linear dynamic ranges of 50 to 10,000 ng/ml for cadmium. The instrumental precision expressed as the relative standard deviation (RSD) from ten replicate measurements of 10,000 ng/ml for cadmium by ETV-ICP-AES was 0.85%. The present method has been successfully applied to the determination of cadmium in zinc-base materials.