Molecular ion yield enhancement induced by gold deposition in static secondary ion mass spectrometry |
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Authors: | Nimer Wehbe Arnaud Delcorte Heinrich F. Arlinghaus |
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Affiliation: | a Unité de Physico-Chimie et de Physique des Matériaux, Université catholique de Louvain, Croix du Sud 1, Louvain-la-Neuve B-1348, Belgium b Physikalisches Institut, Westfälische Wilhelms-Universität Münster, Wilhelm-Klemm-Str. 10, D-48149 Münster, Germany |
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Abstract: | Static ToF-SIMS was used to evaluate the effect of gold condensation as a sample treatment prior to analysis. The experiments were carried out with a model molecular layer (Triacontane M = 422.4 Da), upon atomic (In+) and polyatomic (Bi3+) projectile bombardment. The results indicate that the effect of molecular ion yield improvement using gold metallization exists only under atomic projectile impact. While the quasi-molecular ion (M+Au)+ signal can become two orders of magnitude larger than that of the deprotonated molecular ion from the pristine sample under In+ bombardment, it barely reaches the initial intensity of (M−H)+ when Bi3+ projectiles are used. The differences observed for mono- and polyatomic primary ion bombardment might be explained by differences in near-surface energy deposition, which influences the sputtering and ionization processes. |
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Keywords: | Static ToF-SIMS Gold deposition Yield enhancement Atomic projectile Polyatomic projectile |
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