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Molecular depth profiling of trehalose using a C60 cluster ion beam
Authors:Andreas Wucher  Juan Cheng
Affiliation:a Department of Physics, University of Duisburg-Essen, D-47048 Duisburg, Germany
b Department of Chemistry, Pennsylvania State University, University Park, PA 16802, USA
Abstract:Molecular depth profiling of organic overlayers was performed using a mass selected fullerene ion beam in conjunction with time-of-flight (TOF-SIMS) mass spectrometry. The characteristics of depth profiles acquired on a 300-nm trehalose film on Si were studied as a function of the impact kinetic energy and charge state of the C60 projectile ions. We find that the achieved depth resolution depends only weakly upon energy.
Keywords:Molecular depth profiling   3D imaging   Depth scale calibration
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