Three-dimensional molecular imaging using mass spectrometry and atomic force microscopy |
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Authors: | Andreas Wucher Juan Cheng David Willingham |
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Institution: | a Department of Physics, University of Duisburg-Essen, D-47048 Duisburg, Germany b Department of Chemistry, Pennsylvania State University, University Park, PA 16802, USA |
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Abstract: | We combine imaging ToF-SIMS depth profiling and wide area atomic force microscopy to analyze a test structure consisting of a 300 nm trehalose film deposited on a Si substrate and pre-structured by means of a focused 15-keV Ga+ ion beam. Depth profiling is performed using a 40-keV C60+ cluster ion beam for erosion and mass spectral data acquisition. A generic protocol for depth axis calibration is described which takes into account both lateral and in-depth variations of the erosion rate. By extrapolation towards zero analyzed lateral area, an “intrinsic” depth resolution of about 8 nm is found which appears to be characteristic of the cluster-surface interaction process. |
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Keywords: | Molecular depth profiling 3-D imaging Depth scale calibration |
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